P9000 Cluster System
The C&D P9000 Photoresist Coater & Developer Cluster System is designed to process 50mm to 300mm wafers. The P9000 can be equipped with a wide array of different modules, including multiple photoresist coaters or developers, vapor prime modules, hot plates, and chill plates. Specialized process modules are also available, including the use of optical centering and edge bead removal. C&D’s P9000 Cluster System is designed for flexibility and high throughput within a small footprint. The P9000 can be configured as a coater, developer, vapor prime, bake, chill or any variation, and can process a wide range of photoresist spin coating and photosensitive polymer applications.
C&D Specializes in custom photoresist coaters that are catered to specific customer requirements to increase efficiency and reduce costs. This means that we can reduce the footprint of the tool to fit even the most critical dimensions within a fab. On the other hand, tools can be customized with expansion bays for future implementation of additional modules or increase in substrate size due to increased demand or changes in project developments.
Many new innovations are being created at C&D, and they are all features highlighted within the C&D P9000 capabilities. Special modules, such as ultrasonic spray coating, the C&D revolutionary Synchrospin coating system, and many optical variants of traditional modules such as Optical Edge Bead Removal (OEBR) and Optical Centering.