Photoresist Developer

The C&D Photoresist Developer is designed to process 50mm to 300mm wafers. Available in several of our linear and cluster platforms, the C&D photoresist developer is designed to handle a multitude of different processing requirements. The systems can be configured with multiple dispenses, temperature control, aqueous or solvent develop with a selection of spray nozzles. Options modules such as Optical Edge Bead Exposure (OEBE) and Flood Expose are available to streamline your process within the same tool.

We specialize in custom photoresist developers that are catered to specific customer requirements to increase efficiency and reduce costs. Our expert technical staff are able to fully customize the number of modules and tool layout to fit the size constraints and process requirements coming out of your production needs.

The P9000 photoresist coater and developer cluster system is a state-of-the-art spin coater tool that can be customized to meet the most demanding of process requirements. Designs are made with the customer in mind, with expandable number of modules and process capability for both small and large scale projects.

A vast improvement of the SVG 8X tools of late, the C&D P8000 Advanced Linear Track System is a customizable linear photoresist coater that features a fully software controlled interface. An improvement over the traditional card cage control systems, the P8000 Linear Track features a fully digital C&D developed control box that is handled through a PC computer. The advanced SmartPro software makes recipe creation and reading machine status extremely easy. Software component exercise easily allows maintenance and engineers to take full control of every aspect of the tool including sensors and motors for diagnosis and training.