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Photoresist Coater
The C&D Photoresist Coater is designed to process 50mm to 300mm wafers. The spin coater systems can be configured to process photoresist, PMMA, PMGI, spin on dielectrics, SOG, dopants, and other materials. The hot plate bake ovens can be configured to process various chemistries. Special modules, such as ultrasonic spray coating, the C&D revolutionary Synchrospin spin coater system, and many optical variants of traditional modules such as Optical Edge Bead Exposurel (OEBE) and Optical Centering, flood expose are available. We specialize in custom photoresist coaters that are catered to specific customer requirements to increase efficiency and reduce costs.
P9000 Cluster System
The P9000 photoresist coater and developer cluster system is a state-of-the-art spin coater tool that can be customized to meet the most demanding of process requirements. Designs are made with the customer in mind, with expandable number of modules and process capability for both small and large scale projects.
P8000 – Advanced Linear Track System
A vast improvement of the SVG 8X tools of late, the C&D P8000 Advanced Linear Track System is a customizable linear photoresist coater that features a fully software controlled interface. An improvement over the traditional card cage control systems, the P8000 Linear Track features a fully digital C&D developed control box that is handled through a PC computer. The advanced SmartPro software makes recipe creation and reading machine status extremely easy. Software component exercise easily allows maintenance and engineers to take full control of every aspect of the tool including sensors and motors for diagnosis and training.
