Spin Coater & Developer
P9000 Cluster System
The C&D P9000 Coater Developer Cluster System is designed to process 2” – 12” wafers. The P9000 can be equipped with vapor prime modules, hot plates, and chill plates. C&D’s P9000 Cluster System is designed for flexibility and high throughput within a small footprint. The P9000 can be configured as a coater, developer, vapor prime, bake, chill or any variation, and can process a wide range of photoresist and photosensitive polymer applications.
SVG 8x Track System
The SVG 8X system is capable of processing 2” – 8” wafers. The SVG 88X has the capability of dual wafer size bridging without any hardware change. The SVG 86X belt transfer system works well for square or rectangular substrates while the SVG 88X transfer arms provide minimal contact with the backside of the wafer. SVG 86X can run 2” – 6″ substrates and the SVG 88X can run 2” – 8” substrates.
P8060 Copper Bump Developer
The P8060 Copper Bump Developer was designed specifically for developing dry laminated film resist. The high capacity heat exchanger allows process solution temperature to remain constant ± 2.0˚C and achieving up to 40˚C for long constant spray develop cycles often required by thick laminated films. The heat exchanger can control the developer temperature to four process modules simultaneously for maximum flexibility and throughput. C&D’s pressure tanks can interface with a bulk delivery system that dilutes the developer from a concentrate. This dilution system mixes and fills the canisters without track interruption saving time and money.
P8010 Advanced Linear Track System
The P8010 Advanced Linear Track System is a recipe-driven wafer coater and developer, featuring powerful Rabbit Microprocessors and an intuitive graphical user interface (GUI), which provides unprecedented capabilities for linear track systems. The system offers a wide range of functions which include expanded recipe storage, data logging, manual exercise mode, and system networking. The system can be configured with modules for coating, developing, baking, priming, and chilling.