Alloy/Anneal Systems

The P7000 Wafer Alloy/Anneal System

The P7000 Wafer Alloy/Anneal System is a unique hotplate with atmospheric control specifically tailored for the needs of metal ohmic wafer alloying. The system is primarily designed for the processing of 50mm– 200mm GaAs and InP wafers. It features engineering simplicity, ease of use, and is a cost-effective alternative to the expensive Rapid Thermal Annealing (RTA) with roughly twice as much throughput. Process temperatures in the special Alloy block can process wafers at temperatures up to 500 degrees C.

Each P7000 Alloy System comes with the C&D SmartPro software that makes recipe creation simple and easy. The included component exercise mode allows exercise of all system functions and sensors for easy maintenance and troubleshooting.

The Alloy Module is also available as a module on the P9000 Cluster System